Mécanismes fondamentaux de l'ablation laser femtoseconde en "flux intermédiaire"

Guillaume Petite (1)

1 LSI - Laboratoire des Solides Irradiés - Irradiated Solids Laboratory

This chapter aims at identifying what is specific to femtosecond laser ablation. It reviews the essential basic processes which contribute to femtosecond laser ablation of various materials : energy absorption by the material's electrons, electronic relaxation processes involving either electron-electron or electron-lattice interactions. A number of widely used models are briefly discussed, as well as some pending questions.

Mots clés: Ultrafast processes; laser ablation; electron relaxation

Domaines: Science des matériaux [cond-mat.mtrl-sci]

Guillaume Petite. Mécanismes fondamentaux de l'ablation laser femtoseconde en "flux intermédiaire". Marc Sentis et Olivier Uteza. Lasers et Technologies Femtosecondes, Publications de l'Université de Saint Etienne, pp.319, 2005. ⟨hal-00004159v2⟩